Technostress in Cybersecurity: Evaluating Its Effects on Professional Performance and Organisational Security

  • Jayan Kopparethu Gopinadhan Pillai Capstone Project by Cohort 6 of the National Cyber Security Scholar Program

Abstract

Cybersecurity professionals operate in a high-stakes environment, constantly adapting to evolving threats and managing complex technologies. This intense workload often leads to technostress—the mental and emotional strain caused by excessive technological demands. This study explores how technostress affects cybersecurity professionals, particularly its impact on job performance, decision-making, and organisational security. Through surveys and interviews, the research highlights how stress leads to slower responses, increased errors, and a higher risk of security breaches. Many professionals experience burnout, and with cybersecurity talent in short supply, organisations face additional challenges in maintaining strong security defences. The findings emphasise the urgent need for companies to address technostress by implementing work-life balance initiatives, automation tools, and stress management programs. By doing so, they can create a healthier work environment while also strengthening their overall security posture.

References

1. Brod C. Technostress: The human cost of the computer revolution. (No Title). 1984 Jan 21.
2. Tarafdar, M., Tu, Q., Ragu-Nathan, B. S., & Ragu-Nathan, T. S. (2007). The impact of technostress on role stress and productivity. Journal of Management Information Systems, 24(1), 301-328. https://doi.org/10.2753/MIS0742-1222240109
3. Ayyagari, R., Grover, V., & Purvis, R. (2011). Technostress: Technological antecedents and implications. MIS Quarterly, 35(4), 831-858. https://doi.org/10.2307/41409963
Published
2025-08-19
How to Cite
PILLAI, Jayan Kopparethu Gopinadhan. Technostress in Cybersecurity: Evaluating Its Effects on Professional Performance and Organisational Security. Journal of Advanced Research in Electronics Engineering and Technology, [S.l.], v. 12, n. 1&2, p. 179-187, aug. 2025. ISSN 2456-1428. Available at: <http://thejournalshouse.com/index.php/electronics-engg-technology-adr/article/view/1634>. Date accessed: 28 aug. 2025.